Wyniki 1-6 spośród 6 dla zapytania: authorDesc:"Dariusz CZYLKOWSKI"

Novel low power microwave plasma sources at atmospheric pressure

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The aim of this paper is to present the results of our experimental investigations concerning novel low power microwave plasma sources. Such devices are of high interest from industry point of view, namely for plastic or metal surface treatment. Proposed by us plasma sources are small, simple and low cost. Plasma generated by them is of regular shape. They can be operated at atmospheric pressure, at standard frequency of 2.45 GHz and microwave power lower than 500 W. Streszczenie. Celem pracy jest zaprezentowanie opracowanych przez nas nowych mikrofalowych źródeł plazmy małej mocy. Takie urządzenia cieszą się zainteresowaniem przemysłu w celu zastosowań w obróbce plastikowych i metalowych powierzchni. Zaproponowane przez nas źródła plazmy małej mocy są małe, proste I tanie. Pracują pod ciśnieniem atmosferycznym I standardowej częstotliwości 2,45 GHz. (Nowe małej mocy mikrofalowe źródło plazmy przy ciśnieniu atmosferycznym) Keywords: atmospheric pressure discharge, microwave plasma sources, surface treatment. Słowa kluczowe: wyładowanie pod ciśnieniem atmosferycznym, mikrofalowe źródła plazmy, obróbka powierzchni. Introduction To meet industry expectations of having small and low cost source of plasma for surface treatment we started an experimental investigations concerning this problem. One of the promising plasma application is the removing of unwanted photoresist in the semiconductor and photoelectronic industries [1]. Produced plasma is used for the removal of pollutants in order to improve surface conditions and to enhance the adhesion strength of substrate before photoresist coat. Microwave plasma surface treatment also find applications in cars production, aviation industry, textiles and in biomedical engineering [2-5]. Except abovenamed properties generated plasma should be regular in shape. Currently, devices provided plasmas in the form of flame [6] or column [7] are well known. In this paper we present results of our wor[...]

On the role of the design and discharge conditions on the Surfaguide tuning characteristics

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Stable operation of microwave plasma generator with a good efficiency of power transfer to the plasma needs to take into account a few of important factors. Namely the geometry of the wave launching region and discharge conditions. This report include experimental results on influence of this factors on the tuning characteristics of an atmospheric pressure Surfaguide-type plasma generator. Streszczenie. Praca zawiera wyniki eksperymentalnego badania wpływu geometrii obszaru sprzęgania i warunków wyładowania na charakterystyki strojenia generatora plazmy typu Surfaguide. Od czynników tych zależą stabilna praca generatora plazmy i korzystny energetycznie transfer mocy mikrofal do plazmy. (Wpływ geometrii i warunków wyładowania na charakterystyki strojenia generatora plazmy typu Surfaguide). Keywords: atmospheric pressure discharge, microwave plasma, plasma generator, Surfaguide. Słowa kluczowe: wyładowanie pod ciśnieniem atmosferycznym, plazma generowana mikrofalowo, generator plazmy, Surfaguide. Introduction Since seventies of the twentieth century when the surface wave sustained discharges were discovered as a new plasma source [1], they find practical applications in various fields. The most common are light sources, neutral and active species sources, surface treatment reactors, reactors for chemistry, deposition, etching etc. Today they are still of high interest. One of the promising application is the hydrogen production [2, 3]. Wide range of applications demands appropriate surface wave plasma generator suitable to operate under different discharge conditions. Stable and repeatable operation of such plasma generator with a high efficiency of power transfer to the plasma needs to take into account its geometry as well as discharge conditions [4, 5]. In our experimental study we investigated the influence of that factors on the tuning characteristics of the Surfaguide-type [6] plasma generator. Surfaguide is the waveguide based[...]

Compact microwave plasma device for surface treatment DOI:10.15199/48.2018.07.07

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Plasma (ionised gas) is an object of interest of research centres and commercial companies. Nowadays, from industry point of view, there is a growing interest in not expensive plasma sources for plastic, metal, glass and composite surface modifications. The plasma treated material changes its surfaces properties. For example, as a result of plasma treatment an increase of surface’s adhesion potential can be obtained. Due to plasma modification hydrophobic and hydrophilic surface properties can be established. Using plasma it is also possible to coat material surface with protecting layer or layer of specific characteristics. So, plasma surface treatment can be used in surface cleaning, activating and coating and can be applied for example in cosmetic packaging, medical implants or cars parts [1-9]. In addition to the above, recently, attention is paid to the reduction of investment as well as operating costs of the surface treatment process. The importance of small devices, with low energy consumption, are increasing. Thus the so called “downsizing" is also a recent trend in a plasma science and engineering. Recently existing flame conventional devices dedicated to surface treatment on one hand are not environmentally friendly, on other hand can cause treated surface overheating leading to treated surface deformation. Meanwhile the plasma of moderate temperature is preferable. Against, applied radio frequency (RF) based methods of plasma surface modification are of high cost which further increases investment and operating costs. In this case one of the way is to use a microwave (2.45 GHz) frequency plasma at atmospheric pressure. Operating at atmospheric pressure eliminates an expensive vacuum apparatus. Using standard microwave frequency of 2.45 GHz allows to use cheap commercial magnetron such as that installed in microwave oven. Therefore, to fulfill industry expectations of low cost source of non-thermal [...]

Tuning characteristics of coaxial microwave plasma source operated with argon, nitrogen and methane at atmospheric pressure

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The coaxial microwave plasma source (MPS) is a device used to produce high temperature plasma at atmospheric pressure and high working gases flow rates. In our experiment the plasma was generated with 2.45 GHz microwaves at powers between 600 W and 5600 W. At optimal positions of movable plunger, the use of argon, nitrogen and methane as the working gases caused, that 2 %, 1 % and 5 % of the incident power was reflected, respectively. The MPS can be used in gas processing applications. Streszczenie. Prezentowany współosiowy mikrofalowy generator plazmy jest urządzeniem wytwarzającym plazmę o wysokiej temperaturze pod ciśnieniem atmosferycznym, przy wysokich przepływach gazów. Plazma wzbudzana jest mikrofalami o częstotliwości 2,45 GHz i mocy od 600 W do 5600 W. Odpowiednio dla argonu, azotu oraz metanu przy optymalnym położeniu ruchomego zwarcia moc fali odbitej wynosiła 2%, 1% oraz 5% mocy fali padającej. Generator plazmy może być używany m.in. do obróbki gazów. (Charakterystyki strojenia współosiowego mikrofalowego generatora plazmy w argonie, azocie i metanie pod ciśnieniem atmosferycznym). Keywords: plasma sources, microwave discharges, tuning characteristics, gas processing. Słowa kluczowe: generatory plazmy, wyładowania mikrofalowe, charakterystyki strojenia, obróbka gazów. Introduction Recently, microwave plasma sources (MPSs) operated at atmospheric pressure have been developed [1-16]. Such devices were used in spectroscopy, technological processes like surface treatment, deposition of thin films and sterilization. They also found applications in the processing of various gases. Treatment of hazardous gases [17-19] and production of hydrogen via methane conversion [20, 21] in microwave atmospheric pressure plasmas were reported lately. This paper presents results of experimental investigations with the waveguide-based coaxial microwave plasma source (MPS) [13] operated at atmospheric pressure at [...]

Spectroscopic characterization of plasma generated by microwave device for surface treatment DOI:10.15199/48.2018.07.22

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Nowadays industry is highly interested in various surface treatment. Plasma surface treatment methods include processes like: cleaning, activating, etching the surface. These processes are used as pre-treatment of metal and plastic surfaces for further processes such as: soldering, gluing, painting, print. In contrast to chemical methods, the plasma methods do not require the chemical agents (solvents, acids, alkalis) and large amounts of water, so they are friendly to environment [1-3]. Plasma surface treatment methods also include such processes as: surface modification, surface coating, and thin film deposition. Using plasma methods allows to significantly change the properties of only the surface of materials without changing their properties at the greater depths. Plasma methods can be used for the processing of metals, polymers, glass and fibres, both natural and synthetic. They are used to change the surface properties such as wettability, adhesion, hardness, scratch resistance, permeability, corrosion resistance and others. [4-7]. Plasma surface treatment methods are used in the electronics, automotive, aerospace, textiles and biomedical industries (e.g.: implants) [8-11]. As a response to demand of industry recently we presented a novel compact microwave (2.45 GHz) plasma device for surface treatment [12, 13]. However the knowledge about plasma properties is necessary for development of plasma surface treatment technology. Optical emission spectroscopy (OES) is a powerful and useful tool in the characterization of plasma [14]. Fig. 1. The experimental setup for spectroscopic study of argon microwave atmospheric pressure plasma-sheet. PRZEGLĄD ELEKTROTECHNICZNY, ISSN 0033-2097, R. 94 NR 7/2018 91 Experiments The plasma was generated in waveguide-supplied microwave plasma-sheet source (MPS) operated at 2.45 GHz. Investigated MPS[...]

Hydrogen production by dry reforming of kerosene using microwave plasma DOI:10.15199/48.2016.08.11

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This paper presents results of study of dry reforming of kerosene using a microwave plasma. The plasma was generated in waveguide supplied metal-cylinder-based nozzleless microwave plasma source (MPS) operated at 915 MHz. The rotational temperature of heavy species (assumed to be close to gas temperature) was up to 5500 K (for plasma without kerosene). The hydrogen production rate was up to 470 NL[H2]/h and the energy efficiency was 89.5 NL[H2] per kWh of absorbed microwave. Streszczenie. Artykuł przedstawia wyniki badań suchego reformingu nafty w plazmie mikrofalowej (915 MHz). Temperatura rotacyjna cząstek ciężkich (przyjmowana jako zbliżona do temperatury gazu) wynosiła do 5500 K (dla plazmy bez dodatku nafty). Uzyskana wydajność produkcji wodoru wynosiła do 470 NL [H2]/h, natomiast efektywność energetyczna do 89,5 NL [H2] na kWh zaabsorbowanej energii mikrofal. (Produkcja wodoru na drodze suchego reformingu nafty w plazmie mikrofalowej). Keywords: microwave plasma, hydrogen production, kerosene dry reforming. Słowa kluczowe: plazma mikrofalowa, produkcja wodoru, suchy reforming nafty. Introduction The greenhouse effect from CO2 emissions exhorts searching of new energy sources meeting the requirements of being environment-friendly. Hydrogen which has a high heating value per unit mass (120 kJ/g) and does not produce CO2 in its combustion is a promising future energy carrier. Hydrogen is produced by many methods [1]. The conventional technologies of hydrogen production like coal gasification, hydrocarbon reforming and water electrolysis are well developed. Large scale catalytic hydrogen production has been successfully operating in industry for many decades. Currently it is the most developed and economical technique for hydrogen production. Alternative plasma technologies are very promising for hydrogen production using hydrocarbons conversions. Plasma ensures high chemical reactivity environment allowing to avoid expensive an[...]

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