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Analysis of thickness influence on wettability of ITO thin films


  Tin doped indium oxide (ITO) thin film is a highly degenerated wide gap semiconductor with good conductivity and high optical transmission within the visible spectrum. Due to unique properties, the ITO films have many applications in solar cells, flat panel displays, sensors and organic light emitting diodes (OLED) [1,2]. Reproducible ITO films can be prepared by various methods, including reactive evaporation [3], reactive DC or RF sputtering [4], sol-gel process [5] and chemical vapor deposition (CVD) [6]. Among the mentioned methods, reactive DC or RF magnetron sputtering is the most frequently used ITO deposition methods for optoelectronic device manufacturing because of high sputtering rates that can be obtained at large area coatings [7]. Indium tin oxide coatings are suitable for a wide range of transparent EMC shielding and anti-static applications [8]. The optoelectronic and mechanical properties of ITO films are critical to the development of flexible optoelectronic devices [9]. Contact angles have great potential utility. They can be measured on a macroscopic level to characterize the average wettability of materials. Knowledge of the macroscopic contact angle for materials allows to predict whether a liquid droplet will bead up on or spread out over a solid surface. In their macroscopic use, contact angles are key in measuring the wettability of the surfaces [10]. The water contact angle is often used as a measure of surface hydrophobicity, i.e., the higher the contact angle is, the more hydrophobic the solid Analysis of thickness influence on wettability of ITO thin films (Analiza wpływu grubości na zwilżalność cienkich warstw ITO[...]

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